قصيرة: اكتشف معدات رفع الليزر شبه الموصلات، الحل المتطور لتخفيف البلاط غير المدمر في معالجة أشباه الموصلات.هذه المنصة المتقدمة القائمة على الليزر توفر قطع دقة من طبقات رقيقة للغاية من البلاطات السائبة، مما يقلل من النفايات ويعزز سلامة الركيزة للأجهزة من الجيل التالي.
خصائص المنتج ذات الصلة:
Contact-free, non-destructive thinning for brittle materials like GaN, SiC, and sapphire.
Precision slicing of wafer-scale films with minimal material waste.
Automated control and beam shaping for seamless integration into fabrication workflows.
Supports R&D flexibility and mass production scalability.
Motion-synchronized scanning heads for precise energy delivery.
Reduces microcracking, bowing, and surface chipping risks.
Configurable with burst-mode or multi-pulse capabilities for smooth detachment.
Ideal for power electronics, RF systems, photonics, and micro-displays.
أسئلة وأجوبة:
What is the minimum thickness achievable with the Semiconductor Laser Lift-Off Equipment?
Typically between 10-30 microns, depending on the material, with potential for thinner results using modified setups.
Can the equipment slice multiple wafers from the same ingot?
Yes, the laser lift-off technique allows for serial extractions of multiple thin layers from one bulk ingot.
How does the system compare to diamond wire saws in terms of cost?
While initial capex may be higher, laser lift-off reduces consumable costs, substrate damage, and post-processing steps, lowering total cost of ownership long-term.